734137.fig.0010a
(a)
734137.fig.0010b
(b)
734137.fig.0010c
(c)
Figure 10: (a) Unequal deposition of copper(II) oxide microparticles on filter membranes after a 60min exposure. (b) Inlet-adapter with an integrated jet nozzle to avoid unequal particle deposition within the CULTEX RFS module. (c) Uniform deposition of copper(II) oxide on filter membranes after a 60min exposure with a jet nozzle.