Impact of Dental Implant Surface Modifications on Osseointegration

Figure 7

OsseoSpeed implant (DENTSPLY Implants, Mannheim, Germany). The nanolevel aspect (c) of the OsseoSpeed dental implant (a, b) is the result of titanium oxide blasting followed by etching with hydrofluoric acid. Accumulation of fluoride on the surface is a beneficial side effect of the manufacturing process. Courtesy of DENTSPLY Implants.

(a)

(b)

(c)