An Optimized Adsorbent Sampling Combined to Thermal Desorption GC-MS Method for Trimethylsilanol in Industrial Environments

Table 3

TMSOH concentrations measured in a semiconductor fabrication workshop.

Sampling date	Sample volume (L)	TMSOH concentration (𝜇g/m^3)
		Rep 1	Rep 2
06/23/2010	6	1.58	n.a.
07/08/2010	6	1.32	n.a.
07/21/2010	6^a	1.21	n.a.
	20^a	2.82	n.a.
08/02/2010	6	5.98	n.a.
08/25/2010	20^a	1.02	n.a.
	6^a	2.61	n.a.
09/30/2010	6	3.91	n.a.
10/14/2010	20	2.74	n.a.
08/25/2011	6/20^b	22.51	20.19
08/26/2011	6^c	23.80	27.30

Notes: ^aSamples at two locations within the same workshop. ^bCo-located distributed volume replicate samples, ^cCo-located same volume replicate samples. n.a.: not available.