Research Article

Effect of Isopropyl Alcohol Concentration and Etching Time on Wet Chemical Anisotropic Etching of Low-Resistivity Crystalline Silicon Wafer

Figure 10

70 × 70 μm2 optical microscope images for Si wafers’ surface at different : (a) , (b) , (c) , (d) , and (e) .
(a)
(b)
(c)
(d)
(e)