Research Article
Effect of Isopropyl Alcohol Concentration and Etching Time on Wet Chemical Anisotropic Etching of Low-Resistivity Crystalline Silicon Wafer
Figure 11
10 × 10 μm2 AFM images for Si wafers’ surface at different : (a) , (b) , (c) , (d) , and (e)
| (a) |
| (b) |
| (c) |
| (d) |
| (e) |