Effect of Isopropyl Alcohol Concentration and Etching Time on Wet Chemical Anisotropic Etching of Low-Resistivity Crystalline Silicon Wafer

Table 1

Average total reflectance for different IPA concentrations.

(% vol.)	(400–800 nm)
2	14.40
4	11.22
6	12.34
8	17.45
10	18.25