Optical and Electrical Properties of Magnetron Sputtering Deposited Cu–Al–O Thin Films

Figure 3

SEM micrographs and EDS spectra of Cu–Al–O thin films obtained with different 𝑟_Cu/Al: (a) and (b) 𝑟_Cu/Al=20%; (c) and (d) 𝑟_Cu/Al=45%; (e) and (f) 𝑟_Cu/Al=55%.

(a)

(b)

(c)

(d)

(e)

(f)