Optical and Electrical Properties of Magnetron Sputtering Deposited Cu–Al–O Thin Films

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</svg> of 45% (inset: determination of indirect band gap <svg height="18.3125" id="M102" style="vertical-align:-5.73161pt" version="1.1" viewbox="0 0 20.3125 18.3125" width="20.3125" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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</svg>).</table>

International Journal of Antennas and Propagation

fig7

Figure 7

Figure 7: Optical and Electrical Properties of Magnetron Sputtering Deposited Cu–Al–O Thin Films 