Taming the Electromagnetic Boundaries via Metasurfaces: From Theory and Fabrication to Functional Devices
Figure 53
Interference lithography by surface plasmon polariton. (a) SEM image of the fabricated sample. (b) Simulated electric field distribution. (c) Schematic of the improved lithography technique. (d) Two-dimensional interference patterns. Figures are reproduced from [31, 260].
