Measurement of Primary and Secondary Stability of Dental Implants by Resonance Frequency Analysis Method in Mandible
Figure 1
(a) Osstell mentor device. (b) Osstell mentor probe. (c) Osstell mentor device is in contact with the fixture immediately after placement to measure the baseline stability value of the implant. The same procedure was done once a week until the 5th week after surgery, and then was done once in the 7th and once in the 11th weeks.
