Online Monitoring of Copper Damascene Electroplating Bath by Voltammetry: Selection of Variables for Multiblock and Hierarchical Chemometric Analysis of Voltammetric Data

Table 1

Composition of the training set solutions.

Calibration solution #	Suppressor; mL L^−1	Accelerator; mL L^−1	Leveler; mL L^−1
C1	5.00	5.00	0.38
C2	5.00	6.00	0.57
C3	5.00	7.00	0.76
C4	5.00	8.00	0.94
C5	5.00	9.00	1.13
C6	6.00	5.00	0.57
C7	6.00	6.00	0.76
C8	6.00	7.00	0.94
C9	6.00	8.00	1.13
C10	6.00	9.00	0.38
C11	7.00	5.00	0.76
C12	7.00	6.00	0.94
C13	7.00	7.00	1.13
C14	7.00	8.00	0.38
C15	7.00	9.00	0.57
C16	8.00	5.00	0.94
C17	8.00	6.00	1.13
C18	8.00	7.00	0.38
C19	8.00	8.00	0.57
C20	8.00	9.00	0.76
C21	9.00	5.00	1.13
C22	9.00	6.00	0.38
C23	9.00	7.00	0.57
C24	9.00	8.00	0.76
C25	9.00	9.00	0.94
C26	5.00	5.00	0.38
C27	7.00	7.00	0.76
C28	9.00	9.00	1.13