Online Monitoring of Copper Damascene Electroplating Bath by Voltammetry: Selection of Variables for Multiblock and Hierarchical Chemometric Analysis of Voltammetric Data

Table 2

Composition of the validation set solutions.

Validation solution #	Suppressor; mL L^−1	Accelerator; mL L^−1	Leveler; mL L^−1
V1	5.50	5.50	0.47
V2	5.50	7.00	0.75
V3	5.50	8.50	1.04
V4	7.00	5.50	0.75
V5	7.00	7.00	1.04
V6	7.00	8.50	0.47
V7	8.50	5.50	1.04
V8	8.50	7.00	0.47
V9	8.50	8.50	0.75