Research Article
Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films
Table 1
EDAX data of Mo:ZnO films.
| Atomic percent of Mo in ZnO | Sputtering pressure = 1 × 10−2 mbar, | = 473 K | At.% of oxygen | At.% of zinc | At.% of molybdenum |
| Mo(0%):ZnO | 45.71 | 54.29 | 0 | Mo(1.5%):ZnO | 46.4 | 52.11 | 1.48 | Mo(2%):ZnO
| 46.81 | 51.04 | 2.15 |
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