Research Article
Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films
Table 2
Energy gap data of Mo:ZnO films.
| Atomic percent of Mo in ZnO | Sputtering pressure = 1 × 10−2 mbar, | = 473 K | = 673 K | 1st transition | 2nd transition | 1st transition | 2nd transition | Energy gap () (eV) | Energy gap () (eV) |
| Mo(0%):ZnO | 2.48 | 3.02 | — | 3.15 | Mo(1%):ZnO | — | 3.05 | 3.06 | 3.26 | Mo(1.5%):ZnO | 2.66 | 3.17 | — | 3.43 | Mo(2 %):ZnO | — | 3.34 | — | 3.56 |
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