Polishing Sapphire Substrates by 355 nm Ultraviolet Laser

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="238367.fig.007a" src="https://static.hindawi.com/articles/ijo/volume-2012/238367/figures/238367.fig.007a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>Parallel scanning</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="238367.fig.007b" src="https://static.hindawi.com/articles/ijo/volume-2012/238367/figures/238367.fig.007b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>Intersectional scanning</td></tr></table></td></tr></table>

<table>Laser beam scanning patterns.</table>

International Journal of Optics

fig7

Figure 7

Figure 7: Polishing Sapphire Substrates by 355 nm Ultraviolet Laser 