Abstract
Thin film solar cells based on monocrystalline Si films are transferred to a glass superstrate. Chemical vapor deposition serves to epitaxially deposit Si on quasi-monocrystalline Si films obtained from thermal crystallization of a double layer porous Si film on a Si wafer. A separation layer that forms during this crystallization process allows one to separate the epitaxial layer on top of the quasi-monocrystalline film from the starting Si wafer. We presently achieve an independently confirmed solar cell conversion efficiency of 9:26%. Ray tracing studies in combination with electrical device simulation indicate an efficiency potential of around 17% using simple device processing and moderate assumptions on minority carrier lifetime and surface recombination.