Electrochemical Investigation of Doped Titanium Dioxide

Table 1

Elemental analysis by AES for Cu and Cr doped TiO₂ films.

Sample	Cu doped sample 1 atom% precursor
Element	Carbon	Oxygen	Titanium	Copper
Before etch	8.65%	75.17%	15.79%	0.39%
After etch	22.86%	52.42%	24.64%	0.09%
	Cr doped sample 5 atom% precursor
Element	Carbon	Oxygen	Titanium	Chromium
Before etch	13.57%	66.60%	17.63%	2.20%
After etch	11.44%	66.75%	20.21%	1.59%