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International Journal of Photoenergy
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International Journal of Photoenergy
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2011
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Article
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Fig 2
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Research Article
Studying the Properties of RF-Sputtered Nanocrystalline Tin-Doped Indium Oxide
Figure 2
XRD patterns for ITO thin films deposited using RF power value of 200 W and various deposition time, (a) 10, (b) 20, (c) 30 and (d) 40 min.