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International Journal of Photoenergy
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International Journal of Photoenergy
/
2011
/
Article
/
Tab 2
/
Research Article
Studying the Properties of RF-Sputtered Nanocrystalline Tin-Doped Indium Oxide
Table 2
Resistivity, thickness and refractive index of ITO thin films deposited using RF deposition power value of 200 W for various deposition times.
Deposition time
(min)
Thickness
(
μ
m)
Refractive
index
Resistivity
(Ω·cm)
10
0.46
1.499
20
0.52
1.501
30
0.63
1.503
40
1.09
1.506