Preparation and Properties of SnO₂ Film Deposited by Magnetron Sputtering

Table 1

Film thickness, surface roughness, and particle size of SnO₂ films deposited with different conditions.

Oxygen partial pressure percentage (%)	Deposition time (min)	Thickness (nm)	RMS (nm)	Particle size (nm)
0	20	62	0.612	0.8
	60	148	1.2	2.4
3	60	55	—	—
	110	87	—	—
5	30	50	—	—
	60	58	—	—
	110	70	—	—
10	60	30	0.608	1.4
	135	50	0.56	1.2