Photoelectrochemical Performance of Smooth TiO₂ Nanotube Arrays: Effect of Anodization Temperature and Cleaning Methods

Figure 5

(a) XRD patterns of as-anodized TiO₂ nanotube arrays fabricated at (a) 10°C, (b) 20°C, (c) room temperature, (d) 40°C, (e) 60°C, and (f) 80°C; (b) XRD patterns of annealed TiO₂ nanotube arrays fabricated at (a) 10°C, (b) 20°C, (c) room temperature, (d) 40°C, (e) 60°C, and (f) 80°C after annealing at 400°C in argon atmosphere (A: anatase TiO₂; T: titanium).

(a)

(b)