Modelling of Light Trapping in Acidic-Textured Multicrystalline Silicon Wafers
Figure 1
A scanning electron microscope (SEM) image of an acidic-textured multicrystalline silicon wafer surface showing the formation of randomly arranged etching pits on the surface. The surface was textured for 2 mins at 10°C in a solution comprising an HF : HNO3 : H2O ratio of 15 : 50 : 35.
