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International Journal of Photoenergy
Volume 2012 (2012), Article ID 643895, 8 pages
doi:10.1155/2012/643895
Research Article
Nanostructural, Chemical, and Mechanical Features of nc-Si:H Films Prepared by PECVD
Department of Materials Science and Engineering, Inha University, Incheon, Republic of Korea
Received 29 August 2011; Revised 26 November 2011; Accepted 5 January 2012
Academic Editor: Junsin Yi
Copyright © 2012 Jong-Ick Son et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
How to Cite this Article
Jong-Ick Son, Hee-Jong Nam, and Nam-Hee Cho, “Nanostructural, Chemical, and Mechanical Features of nc-Si:H Films Prepared by PECVD,” International Journal of Photoenergy, vol. 2012, Article ID 643895, 8 pages, 2012. doi:10.1155/2012/643895