Doped Titanium Dioxide Films Prepared by Pulsed Laser Deposition Method

Table 1

Preparation of TiO₂ thin films by PLD method.

Laser	Substrate	Target	Dopant	Crystalline phase	Ambient air	Photocatalytic activity *	Year	Ref.
Nd:YAG,532 nm	glass	TiO2	—	rutile	O2	—	1999	[38]
ArF 193 nm	Mica, quartz, Si	TiO2	—	Rutile, anatase	Ar	—	2002	[39]
ArF 193 nm	𝛼-Al2O3	Ti	—	Rutile, anatase	O2	—	2004	[40]
Nd:YAG,266 nm	Si	TiO2	—	Rutile, anatase	O2	MB, anatase with clusters	2005	[34]
Nd:YAG,532 nm	SiO2(corning 7059)	Ti,TiO,TiO2,TiN	N	anatase	O2, N2	MB, TiN target	2005	[37]
Nd:YAG,532 nm	Glass	Ti	N	anatase	NH3/N2/O2	—	2006	[26]
KrF 248 nm	Si or quartz glass	Ti, TiO2, WO3	multilayer	—	O2	MB, WO3, 5%	2006	[41]
Nd:YAG,1064 nm	quartz glass	TiO2	N	anatase	O2, N2	MB, MO, Eg = 1.0 eV, 2.5 eV	2008	[42]
KrF 248 nm	LSAT	TiO2,TiN	N	anatase	O2	—	2008	[43]
Nd:YAG,266 nm	quartz	TiO2, La2O3	La	Rutile	N2	MB, 900°C postannealing	2009	[44]
KrF 248 nm	glass	TiO2	C, N	anatase	O2, N2,CH4	Cr(II), N doped	2010	[25]
KrF 248 nm	SiO2 quartz	TiO2	N	anatase	O2, N2	—	2010	[45]
KrF 248 nm	SiO2 quartz	Ag, TiO2	—	anatase	O2	MB	2011	[33]

*Organic compound for decomposition and optimal conditions obtained. MO: methyl orange, MB: methylene blue, Cr(II): toxic Chromium ion, it can be photoreducted to Cr(III) state.