Research Article

Current Mechanism in H f O 2 -Gated Metal-Oxide-Semiconductor Devices

Figure 8

The temperature-dependent curves of the (a) C-V and (b) G/ω-V characteristics of Al/HfO2/p-Si (MOS) structure as measured at 1 MHz.
858350.fig.008a
(a)
858350.fig.008b
(b)