Silicon Nitride Film by Inline PECVD for Black Silicon Solar Cells

<table>The microstructure of the as-deposited <svg height="15.65" id="M21" style="vertical-align:-3.39066pt" version="1.1" viewbox="0 0 32.537498 15.65" width="32.537498" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.017,-0,0,-.017,.062,11.362)"><use xlink:href="#x53"></use></g><g transform="matrix(.017,-0,0,-.017,8.018,11.362)"><use xlink:href="#x69"></use></g><g transform="matrix(.017,-0,0,-.017,12.574,11.362)"><use xlink:href="#x4E"></use></g>
<g transform="matrix(.012,-0,0,-.012,25.2,15.45)"><use xlink:href="#x1D465"></use></g>
</svg> film (a) NH<sub>3</sub>/SiH<sub>4</sub> ratio = 9 and (b) NH<sub>3</sub>/SiH<sub>4</sub> ratio = 5. </table>

International Journal of Photoenergy

Silicon Nitride Film by Inline PECVD for Black Silicon Solar Cells

Figure 4