Silicon Nitride Film by Inline PECVD for Black Silicon Solar Cells

<table>FTIR transmission spectra of <svg height="15.65" id="M26" style="vertical-align:-3.39066pt" version="1.1" viewbox="0 0 32.537498 15.65" width="32.537498" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.017,-0,0,-.017,.062,11.362)"><use xlink:href="#x53"></use></g><g transform="matrix(.017,-0,0,-.017,8.018,11.362)"><use xlink:href="#x69"></use></g><g transform="matrix(.017,-0,0,-.017,12.574,11.362)"><use xlink:href="#x4E"></use></g>
<g transform="matrix(.012,-0,0,-.012,25.2,15.45)"><use xlink:href="#x1D465"></use></g>
</svg> films deposited at 425°C, 450°C, and 475°C, respectively.</table>

International Journal of Photoenergy

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Figure 6

Figure 6: Silicon Nitride Film by Inline PECVD for Black Silicon Solar Cells 