The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells
Figure 4
AFM images (left 3D and right 2D) of Mo thin films deposited using various sputtering parameters: (a) experimental conditions no. 3, Ra = 2.703 nm; (b) no. 6, Ra = 3.132 nm; and (c) no. 9, Ra = 3.121 nm.
