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International Journal of Photoenergy
Volume 2013 (2013), Article ID 843410, 6 pages
http://dx.doi.org/10.1155/2013/843410
Research Article

The Effects of Dilute Sulfuric Acid on Sheet Resistance and Transmittance in Poly(3,4-thylenedioxythiophene): Poly(styrenesulfonate) Films

1Department of Electronic Engineering, National Formosa University, Hu-Wei, Yunlin 63201, Taiwan
2Department of Electronic Engineering, Fortune Institute of Technology, Kaohsiung 83160, Taiwan
3Department of Aviation & Communication Electronics, Air Force Institute of Technology, Kaohsiung 82044, Taiwan
4Department of Electnical Engineering, National University of Kaohsiung, Kaohsiung 81148, Taiwan
5Department of Applied Physics, National University of Kaohsiung, Kaohsiung 81148, Taiwan

Received 15 September 2013; Accepted 3 October 2013

Academic Editor: Liang-Wen Ji

Copyright © 2013 Teen-Hang Meen et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Teen-Hang Meen, Kan-Lin Chen, Yu-Hao Chen, et al., “The Effects of Dilute Sulfuric Acid on Sheet Resistance and Transmittance in Poly(3,4-thylenedioxythiophene): Poly(styrenesulfonate) Films,” International Journal of Photoenergy, vol. 2013, Article ID 843410, 6 pages, 2013. doi:10.1155/2013/843410