Effect of Different Deposition Power of In<sub>2</sub>O<sub>3</sub> Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method

<table>Transmittance spectrum of IGZO thin films as a function of deposition power of In<sub>2</sub>O<sub>3</sub> target.</table>

International Journal of Photoenergy

fig5

Figure 5

Figure 5: Effect of Different Deposition Power of In<sub>2</sub>O<sub>3</sub> Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method 

International Journal of Photoenergy

Effect of Different Deposition Power of In2O3 Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method

Figure 5

Effect of Different Deposition Power of In₂O₃ Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method