Effect of Different Deposition Power of In<sub>2</sub>O<sub>3</sub> Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method

<table>(<i><i>α</i> </i><svg height="9.8095pt" id="M28" style="vertical-align:-0.1631899pt" version="1.1" viewbox="0 -9.64631 13.165 9.8095" width="13.165pt" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink"><g transform="matrix(.0135,0,0,-0.0135,0,0)"><path d="M499 88L487 113C459 86 422 65 413 65C403 65 403 74 409 98L461 318C487 426 460 448 431 448C408 448 383 441 352 424C305 398 223 344 157 257H155L243 674C249 702 249 712 240 712C227 712 170 680 87 673L82 648H117C155 648 162 644 150 590L23 -4L30 -12C55 -4 81 3 105 8C113 53 131 150 143 187C199 281 323 387 372 387C390 387 393 369 380 311L328 86C313 19 319 -12 347 -12C379 -12 442 24 499 88Z" id="g113-105"></path><glyph.data ascent="3473" descent="-2876" horiz-adv-x="516" vert-adv-y="516"></glyph.data></g><g transform="matrix(.0136,0,0,-0.0136,6.991,0)"><path d="M213 67C239 136 257 225 255 300C253 353 242 447 164 447C112 447 54 389 41 319L67 309C90 362 117 377 134 377C184 377 189 277 190 239C193 153 164 43 146 -12H176C278 73 450 253 450 390C450 439 410 463 396 463C384 463 380 459 382 449C385 440 389 415 389 402C389 284 312 146 216 67H213Z" id="g185-47"></path><glyph.data ascent="816" descent="-243" horiz-adv-x="454" vert-adv-y="454"></glyph.data></g></svg>)<sup>2</sup> versus<i> h<i>ν</i>-E </i><sub><i>g</i></sub> plots of IGZO thin films as a function of deposition power of In<sub>2</sub>O<sub>3</sub> target.</table>

International Journal of Photoenergy

fig6

Figure 6

Figure 6: Effect of Different Deposition Power of In<sub>2</sub>O<sub>3</sub> Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method 

International Journal of Photoenergy

Effect of Different Deposition Power of In2O3 Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method

Figure 6

Effect of Different Deposition Power of In₂O₃ Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method