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International Journal of Photoenergy
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International Journal of Photoenergy
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2014
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Article
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Fig 3
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Research Article
The Structure and Stability of Molybdenum Ditelluride Thin Films
Figure 3
XRD patterns of Mo-Te thin films with a thickness of 450 nm annealed at 485°C, 495°C, and 500°C for 15 minutes in N
2
ambient.
(a)
(b)
(c)