Review Article

Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone

Table 1

Film thickness, polymers, and solvents.

Polymer samples/solventsThickness (μm)

AZ61121.35
Novolak resin ( = 15000)/PGMEA0.96
cis-1,4-polyisoprene ( = 38000)/xylene0.40
PVP ( = 20000)/ethyl lactate1.62
PS ( = )/toluene0.66
PMMA ( = 96700)/ethyl lactate1.30
PVC ( = 68750)/cyclohexanone1.32