Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone

Table 3

The damaged layer thickness measured by resist removal using wet ozone, SEM images, and resist removal using chemicals.

Sample	Resist removal (wet ozone) damaged layer	SEM observation damaged layer	Resist removal (chemicals) damaged layer
10 keV (B ions)	40 nm	110 nm	90 nm
70 keV (B ions)	200 nm	500 nm	407 nm
150 keV (B ions)	—	830 nm	660 nm
10 keV (P ions)	30 nm	—	40 nm
70 keV (P ions)	—	330 nm	140 nm
150 keV (P ions)	—	500 nm	400 nm