Review Article
Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone
Table 4
Percentages of ion-implanted resist damaged layer by SEM and stripping of ion-implanted resist using chemicals.
| Sample | Resist removal (wet ozone) damaged layer/total | SEM observation damaged layer/total | Resist removal (chemicals) damaged layer/total |
| 10 keV (B ions) | 0.04 | 0.09 | 0.08 | 70 keV (B ions) | 0.25 | 0.60 | 0.50 | 150 keV (B ions) | — | 0.72 | 0.60 |
| 10 keV (P ions) | 0.03 | — | 0.03 | 70 keV (P ions) | — | 0.34 | 0.25 | 150 keV (P ions) | — | 0.46 | 0.36 |
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