Table 4:
Percentages of ion-implanted resist damaged layer by SEM and stripping of ion-implanted resist using chemicals.
Sample
Resist removal (wet ozone) damaged layer/total
SEM observation damaged layer/total
Resist removal (chemicals) damaged layer/total
10 keV (B ions)
0.04
0.09
0.08
70 keV (B ions)
0.25
0.60
0.50
150 keV (B ions)
—
0.72
0.60
10 keV (P ions)
0.03
—
0.03
70 keV (P ions)
—
0.34
0.25
150 keV (P ions)
—
0.46
0.36