Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology

Figure 2

AFM topography images of PS-b-PFS thin films on Si substrates prepared from 1.0 wt.% solution of the polymer in toluene after 3 h exposure to (a) toluene, (b) acetone, (c) hexane, (d) heptane, (e) cyclohexane, and (f) THF atmospheres at room temperature.

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