Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology

Figure 3

AFM topography images of PS-b-PFS thin films on Si substrates prepared from 1.0 wt.% solution of the polymer in toluene after exposure to a THF for (a) 15 min, (b) 30 min, (c) 45 min, and (d) 1 h at room temperature.

(a)

(b)

(c)

(d)