Research Article
Microphase Separation of a PS-b-PFS Block Copolymer via Solvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology
Figure 4
AFM topography images of PS-b-PFS thin films after exposure to THF for 1 h at room temperature prepared from a 1.0 wt.% solution of the polymer on substrates of (a) Si3N4, (b) SiOxNy (c) Ge, (d) W, (e) polymer brush modified Si, and (f) graphene.
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