Physical Models of Plasma Microfield

Figure 21

Distribution of static ion microfield [135], produced by positive charges (a) and by charges of both signs (b) (solid lines correspond to Coulomb interaction, dashed lines to hypothetic microfield distribution with Debye screening): 1: 𝑇→∞ modified Holtsmark distribution accounting to finite number of particles in modeling; 2: 𝑇=1 eV, plasma coupling parameter 𝑑≡(𝑟_𝑐/𝑅₀)³=0.006; 3: 𝑇=0.5 eV, 𝑑=0.05; 4 is nearest neighbor distribution 𝑊(𝛽)=(3/2)𝛽^−5/2exp[−𝛽^−3/2] (solid lines are normalized by condition ∫𝑑𝛽𝑊(𝛽)=1, dashed ones by-∫𝑑𝛽𝑊(𝛽)=1/2; density of like-sign charges 𝑁=𝒩/𝑅³=10¹⁸ cm−3, 𝒩=27, 𝑅=0.03𝜇; total density of particles 2𝑁, 2𝒩=54; 𝛽₊=𝐹₊/𝐹_+,0, 𝛽_Σ=𝐹_Σ/𝐹_Σ,0, 𝐹_+,0=(4𝜋𝒩/3)^2/3𝑒, 𝐹_Σ,0=2^2/3𝐹_+,0).

(a)

(b)