Research Article

Structural, Optical, and Luminescence Properties of Reactive Magnetron Sputtered Tungsten Oxide Thin Films

Table 1

Deposition conditions for preparation of WO3 films.

Sputter targetTungsten (50 mm dia.)
Target to substrate distance50 mm
Base pressure4 × 10−4 Pa
Oxygen partial pressure (pO2) 4 × 10−2–1 × 10−1 Pa
Sputter pressure4 Pa
Sputter power 150 W
Substrate temperature 303 K