Spray Pyrolysis Deposition of Nanostructured Tin Oxide Thin Films

<table class="table-group" id="tab1"><tr><td><table class="table"><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr class="thead"><td align="left">Spray parameters</td><td align="center">Optimum value/item</td></tr><tr><td class="thead-hr" colspan="2"><hr/></td></tr><tr><td align="left">Nozzle</td><td align="center">Glass</td></tr><tr><td align="left">Nozzle-substrate distance</td><td align="center">25 cm</td></tr><tr><td align="left">SnCl<sub>4</sub>·5H<sub>2</sub>O solution concentration</td><td align="center">0.1 M</td></tr><tr><td align="left">Solvent</td><td align="center">Distilled water</td></tr><tr><td align="left">Solution flow rate</td><td align="center">4 mL/min</td></tr><tr><td align="left">Carrier gas</td><td align="center">Compressed air</td></tr><tr><td align="left">Substrate temperature</td><td align="center">250<sup>°</sup>C</td></tr><tr class="table-tr"><td colspan="2"><hr class="tbody-hr"/></td></tr></table></td></tr></table>

Process parameters for the spray deposition of the films.

International Scholarly Research Notices

tab1

Table 1

Table 1: Spray Pyrolysis Deposition of Nanostructured Tin Oxide Thin Films 