Research Article
Structural, Electrical, and Optical Properties of Reactively Sputtered Ag-Cu-O Films
Table 1
Deposition parameters for the growth of Ag-Cu-O thin films.
| | Sputter target | Ag80Cu20 (50 mm diameter and 3 mm thick) | | Ultimate pressure | 2 × 10−4 Pa | | Target to substrate distance | 65 mm | | Oxygen partial pressure (pO2) | 5 × 10−3–5 × 10−2 Pa | | Sputter pressure | 4 Pa | | Substrate temperature | 303 K | | Sputter power | 65 W |
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