Plasma-Based Surface Modification of Polydimethylsiloxane for PDMS-PDMS Molding

Table 1

Recipes for photolithography (SU8-2050).

Thickness	Spinning	Before bake	Exp. dose	After bake	Developing
50 μm	3000 RPM	95° 15 min	600 mJ cm^−2	95° 5 min	5 min
300 μm	500 RPM	95° 4 hours	3600 mJ cm^−2	95° 15 min	30 min