Research Article
Structural, Optical, and Luminescence Properties of Reactive Magnetron Sputtered Tungsten Oxide Thin Films
Table 1
Deposition conditions for preparation of WO3 films.
| Sputter target | Tungsten (50 mm dia.) | Target to substrate distance | 50 mm | Base pressure | 4 × 10−4 Pa | Oxygen partial pressure (pO2) | 4 × 10−2–1 × 10−1 Pa | Sputter pressure | 4 Pa | Sputter power | 150 W | Substrate temperature | 303 K |
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