Influence of Oxygen on Zinc Oxide Films Fabricated by Ion-Beam Sputter Deposition

Table 1

The resistivities and thickness of the films deposited at various oxygen partial pressures.

Sample	Sheet resistivity; (Ω/square)	Thickness; (nm)	Resistivity; (mΩ·cm)
ZnO-2	1860±50	96.1	13.7±0.4
ZnO-4	1500±400	94.2	10.6±2.8
ZnO-8	940±20	102.5	7.40±0.37
ZnO-10	400±20	86.9	2.64±0.16
ZnO-12	256±3	122.0	2.40±0.02
ZnO-15	368±7	117.0	3.31±0.06
ZnO-20	480±10	114.9	4.22±0.13