Structural and Optical Properties of Aluminum Nitride Thin Films Deposited by Pulsed DC Magnetron Sputtering

<table>Experimental <svg height="11.325" id="M11" style="vertical-align:-0.0pt" version="1.1" viewbox="0 0 12.45 11.325" width="12.45" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.017,-0,0,-.017,.062,11.262)"><path d="M699 659l10 -27q-31 -17 -42 -39t-21 -74l-14 -69q-10 -53 -26 -82t-47 -53q-58 -45 -156 -48v-145q0 -58 14.5 -74t71.5 -20v-28h-256v28q57 4 71 20t14 74v145q-104 3 -163 49q-29 23 -45 54t-25 82l-12 72q-11 62 -20 77q-11 19 -38 31l10 27q74 -11 106 -50
q20 -24 30 -78l11 -60q16 -92 48.5 -128t97.5 -41v227q0 57 -13.5 73t-66.5 20v28h245v-28q-53 -4 -66.5 -20t-13.5 -73v-227q75 4 103.5 37.5t45.5 132.5l10 58q8 51 33 80q35 38 104 49z" id="x3A8"></path></g>
</svg> and <svg height="11.425" id="M12" style="vertical-align:-0.0pt" version="1.1" viewbox="0 0 11.025 11.425" width="11.025" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.017,-0,0,-.017,.062,11.363)"><path d="M600 0h-557v24l268 633l28 8l261 -641v-24zM497 50l-194 489l-196 -489h390z" id="x394"></path></g>
</svg> versus wavelength along with best-fit theoretical curve for AlN thin film deposited on Si (100) at 80% flow ratio of nitrogen/argon. Fitting was done with Tauc-Lorentz model. </table>

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Figure 4

Figure 4: Structural and Optical Properties of Aluminum Nitride Thin Films Deposited by Pulsed DC Magnetron Sputtering 