Silicon-Based Technology for Ligand-Receptor Molecular Identification

Table 1

Ellipsometric measurements of the surface layer thickness after each reaction step.

Steps	Sample thickness (nm)
	1	2	3	4
Oxide	73.4±0.2	72.4 ± 0.2	75.0 ± 0.3	75.8 ± 0.4
APTES + GA	2.1 ± 0.2	3.1 ± 0.3	3.1 ± 0.3	3.0 ± 0.4
Protein A	0.85 ± 0.1	0.67 ± 0.08	0.75 ± 0.1	0.68 ± 0.09
Spectral range	500–1600	500–1600	500–1600	500–1600
𝜒2	0.45	0.43	0.47	0.54

1, 2, 3, 4 represents four random microwells of the wafer chosen for chemical and physical characterization.