Ultrasonic-Assisted Synthesis of Two<i> t</i>-Butoxycarbonylamino Cephalosporin Intermediates on SiO<sub>2</sub>

<div>The structure of silicon dioxide surface (note: 1: silicon oxygen group; 2: isolated hydroxyl group; 3: adjacent hydroxyl group; 4: double hydroxyl group).</div>

Journal of Chemistry

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Figure 2

Figure 2: Ultrasonic-Assisted Synthesis of Two<i> t</i>-Butoxycarbonylamino Cephalosporin Intermediates on SiO<sub>2</sub> 

Journal of Chemistry

Ultrasonic-Assisted Synthesis of Two t-Butoxycarbonylamino Cephalosporin Intermediates on SiO2

Figure 2

Ultrasonic-Assisted Synthesis of Two t-Butoxycarbonylamino Cephalosporin Intermediates on SiO₂