Surface Modification and Alloying of Aluminum and Titanium Alloys with Low-Energy, High-Current Electron Beams

<table>TEM image of a multilayer (Al/Si/Al/Si/Al/Si/Al) system on an Al substrate after pulsed melting of Al layers: (a) bright-field image, (b) diffraction pattern (2.5 <i>μ</i>s, 2.3 J/cm<sup>2</sup>, <svg height="11.125" id="M25" style="vertical-align:-0.1638pt" version="1.1" viewbox="0 0 41.900002 11.125" width="41.900002" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
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Journal of Metallurgy

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Figure 13

Figure 13: Surface Modification and Alloying of Aluminum and Titanium Alloys with Low-Energy, High-Current Electron Beams 