Stoichiometry Control of ZnO Thin Film by Adjusting Working Gas Ratio during Radio Frequency Magnetron Sputtering
Figure 4
SEM images of as-deposited ZnO films obtained under different gas ratios (a) Ar: 30 (sccm), (b) Ar/O2: 10/5 (sccm/sccm), (c) Ar/O2: 10/10 (sccm/sccm), (d) Ar/O2: 10/30 (sccm/sccm), and (e) O2: 30 (sccm).
